The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl. You will be embedded in the Nanolayers group at ARCNL and work in a close collaboration with the Materials and Surface Science for EUVL group. Both groups are part of ARCNL’s Materials Department and perform basic research into the structure, composition and the resulting physical and chemical behavior of surfaces, interfaces and thin films in the context of EUV lithography.